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XV750 Imageline Etch Resist Family
Imageline XV750 etch resist is a liquid photoimageable product, which dries by evaporation to give a film that can be sensitized by exposure to UV wavelengths between 310nm and 420nm (for conventional exposure products scatter light type units can be used, it is not essential to use a collimated light source). The unexposed material is developed in dilute alkali solution. The remaining film is then stable in etch solution. After the etch process the film can be stripped in strong caustic media.

XV750 liquid etch resists can offer several key benefits over traditional dry film process; 30-50% Saving over Dry Film
50-70µm (2-3mil) Line and Space with better resolution
Faster developing and etching times
Improved adhesion and performance to Metals / Alloys

Versions are available suitable for application by Screen Printing , Dip Coating , Roller Coating, Curtain Coating and Spray . A Laser Direct Imaging (LDI) version is also available.
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