Thermal Drying, Photo imageable, aqueous develop.
Scatter light type exposure units can be used.
Suitable for both acid and alkali etching (up to pH9.5)
Can also be used as an electrolytic plating resist, however it has been found unsuitable for electroless plating processes.
Stripping solution of 5% potassium hydroxide is recommended (sodium hydroxide can be used) @ 50-60OC
Normal print thickness is 8-12micron DFT using a 100T/cm mesh, higher film weights are possible using coarser meshes (e.g., 62T or 77T/cm).
Resolution of 50µm (2mil) is usually achievable (resolution is always dependant not just on the etch resist but customers develop & etch capability and production
environment – clean room class 10,000 is recommended)
Good photospeed (150-200mJ/cm2)
Single pack system with good shelf life.

Available in dark blue colour only & comes in 1kg packs

CAWN1112 Imageline Etch resist