Thermal Drying, Photo imageable, aqueous develop.
Scatter light type exposure units can be used.
Mainly aimed at acid etching, however alkali solutions up to maximum pH8.5 can be used.
Reasonably fast stripping. Stripping solution of 5% potassium hydroxide at 40-50°C is recommended (sodium hydroxide can also be used).
Normal coating thickness 8-10µm DFT.
Resolution 50µm is usually achievable (resolution is always dependant not just on the etch resist but customers develop & etch capability and production environment – clean room class 10,000 is recommended).
Excellent photospeed (50-100mJ/cm2).
Single pack system with excellent shelf life.
Available in dark blue colour only & comes in 10kg packs

CAWN1302 Imageline Etch Resist